Wafer Doping – Deposition

The second, but not less important semiconductor process step, is the wafer doping. The purpose here is to explore the techniques used to growth/deposit films on the wafer surface as a drive-in diffusion pre-step, i.e., the films used as a dopants source with the objective of modify the physical, chemical, or electronic properties of theContinue reading “Wafer Doping – Deposition”